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Register a new userDegradation of Ag/Si multilayers during heat treatments
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Microstructure changes during annealing of nano-crystalline silver and amorphous silicon multilayers (Ag/a-Si) have been studied by X-ray diffraction and transmission electron microscopy. The dc-magnetron sputtered Ag/a-Si multilayers remained stable even after annealing at 523K for 10h, and microstructural changes occurred only above 600K. The degradation of Ag/a-Si multilayers can be described by the increase of size of Ag grains, formation of grooves and pinholes at Ag grain boundaries and by the diffusion of silicon atoms through the silver grain boundaries and along the Ag/a-Si interfaces. This results in thinning of a-Si layers, and in formation of Ag granulates after longer annealing times.
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A study is presented of the structural changes occurring as a function of the annealing conditions in hydrogenated amorphous Si/Ge multilayers prepared by sputtering. Annealing changes the structure of the as-deposited multilayer except for the less severe conditions here applied (150 oC, time<22 h). For higher temperatures and/or times, the modifications consist of layer intermixing and surface degradation in the shape of bumps and craters. They are argued to be due to the formation of H bubbles upon heating. Hydrogen should be mostly released from the amorphous Ge layers.
Results of magnetization, magnetotransport and Mossbauer spectroscopy measurements of sequentially evaporated Fe-Ag granular composites are presented. The strong magnetic scattering of the conduction electrons is reflected in the sublinear temperature dependence of the resistance and in the large negative magnetoresistance. The simultaneous analysis of the magnetic properties and the transport behavior suggests a bimodal grain size distribution. A detailed quantitative description of the unusual features observed in the transport properties is given.
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