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Register a new userEnergy transfer processes in Er-doped SiO2 sensitized with Si nanocrystals
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We present a high-resolution photoluminescence study of Er-doped SiO2 sensitized with Si nanocrystals (Si NCs). Emission bands originating from recombination of excitons confined in Si NCs and of internal transitions within the 4f-electron core of Er3+ ions, and a band centered at lambda = 1200nm have been identified. Their kinetics have been investigated in detail. Based on these measurements, we present a comprehensive model for energy transfer mechanisms responsible for light generation in this system. A unique picture of energy flow between subsystems of Er3+ and Si NCs is developed, yielding truly microscopic information on the sensitization effect and its limitations. In particular, we show that most of the Er3+ ions available in the system are participating in the energy exchange. The long standing problem of apparent loss of optical activity of majority of Er dopants upon sensitization with Si NCs is clarified and assigned to appearance of a very efficient energy exchange mechanism between Si NCs and Er3+ ions. Application potential of SiO2:Er sensitized by Si NCs is discussed in view of the newly acquired microscopic insight.
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The changes in the lifetime of a metastable energy level in Er-doped Si nanocrystals in the presence of an external source of colored noise are analyzed for different values of noise intensity and correlation time. Exciton dynamics is simulated by a set of phenomenological rate equations which take into account all the possible phenomena inherent to the energy states of Si nanocrystals and Er$^{3+}$ ions in the host material of Si oxide. The electronic deexcitation is studied by examining the decay of the initial population of the Er atoms in the first excitation level $^4$I$_{13/2}$ through the fluorescence and the cooperative upconversion by energy transfer. Our results show that the deexcitation process of the level $^4$I$_{13/2}$ is slowed down within wide ranges of noise intensity and correlation time. Moreover, a nonmonotonic behavior of the lifetime with the amplitude of the fluctuations is found, characterized by a maximum variation for values of the noise correlation time comparable to the deexcitation time. The indirect influence of the colored noise on the efficiency of the energy transfer upconversion activated from the level $^4$I$_{13/2}$ is also discussed.
Binary collision simulations of high-fluence 1 keV Si ion implantation into 8 nm thick SiO2 films on (001)Si were combined with kinetic Monte Carlo simulations of Si nanocrystal (NC) formation by phase separation during annealing. For nonvolatile memory applications, these simulations help to control size and location of NCs. For low concentrations of implanted Si, NCs form via nucleation, growth and Ostwald ripening, whereas for high concentrations Si separates by spinodal decomposition. In both regimes, NCs form above a thin NC free oxide layer at the SiO2/Si interface. This, self-adjusted layer has just a thickness appropriate for NC charging by direct electron tunneling. Only in the nucleation regime the width of the tunneling oxide and the mean NC diameter remain constant during a long annealing period. This behavior originates from the competition of Ostwald ripening and Si loss to the Si/SiO2 interface. The process simulations predict that, for nonvolatile memories, the technological demands on NC synthesis are fulfilled best in the nucleation regime.
In the present theoretical work we have considered impurities, either boron or phosphorous, located at different substitutional sites in silicon quantum dots (Si-QDs) with diameters around 1.5,nm, embedded in a SiO2 matrix. Formation energy calculations reveal that the most energetically-favored doping sites are inside the QD and at the Si/SiO2 interface for P and B impurities, respectively. Furthermore, electron and hole transport calculations show in all the cases a strong reduction of the minimum voltage threshold, and a corresponding increase of the total current in the low-voltage regime. At higher voltage, our findings indicate a significant increase of transport only for P-doped Si-QDs, while the electrical response of B-doped ones does not stray from the undoped case. These findings are of support for the employment of doped Si-QDs in a wide range of applications, such as Si-based photonics or photovoltaic solar cells.
We studied polycrystalline B2-type Co2FeAl (CFA) full-Heusler alloy based magnetic tunnel junctions (MTJs) fabricated on a Si/SiO2 amorphous substrate. Polycrystalline CFA films with a (001) orientation, a high B2 ordering, and a flat surface were achieved using a MgO buffer layer. A tunnel magnetoresistance (TMR) ratio up to 175% was obtained for an MTJ with a CFA/MgO/CoFe structure on a 7.5-nm-thick MgO buffer. Spin-transfer torque induced magnetization switching was achieved in the MTJs with a 2-nm-thick polycrystalline CFA film as a switching layer. Using a thermal activation model, the intrinsic critical current density (Jc0) was determined to be 8.2 x 10^6 A/cm^2, which is lower than 2.9 x 10^7 A/cm^2, the value for epitaxial CFA-MTJs [Appl. Phys. Lett. 100, 182403 (2012)]. We found that the Gilbert damping constant evaluated using ferromagnetic resonance measurements for the polycrystalline CFA film was ~0.015 and was almost independent of the CFA thickness (2~18 nm). The low Jc0 for the polycrystalline MTJ was mainly attributed to the low damping of the CFA layer compared with the value in the epitaxial one (~0.04).
Fe-doped ZnO nanocrystals are successfully synthesized and structurally characterized by using x-ray diffraction and transmission electron microscopy. Magnetization measurements on the same system reveal a ferromagnetic to paramagnetic transition temperature > 450 K with a low-temperature transition from ferromagnetic to spin-glass state due to canting of the disordered surface spins in the nanoparticle system. Local magnetic probes like EPR and Mossbauer indicate the presence of Fe in both valence states Fe2+ and Fe3+. We argue that the presence of Fe3+ is due to the possible hole doping in the system by cation (Zn) vacancies. In a successive ab-initio electronic structure calculation, the effects of defects (e.g. O- and Zn-vacancy) on the nature and origin of ferromagnetism are investigated for Fe-doped ZnO system. Electronic structure calculations suggest hole doping (Zn-vacancy) to be more effective to stabilize ferromagnetism in Fe doped ZnO and our results are consistent with the experimental signature of hole doping in the ferromagnetic Fe doped ZnO samples.
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