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Register a new userNanolithography and manipulation of graphene using an atomic force microscope
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We use an atomic force microscope (AFM) to manipulate graphene films on a nanoscopic length scale. By means of local anodic oxidation with an AFM we are able to structure isolating trenches into single-layer and few-layer graphene flakes, opening the possibility of tabletop graphene based device fabrication. Trench sizes of less than 30 nm in width are attainable with this technique. Besides oxidation we also show the influence of mechanical peeling and scratching with an AFM of few layer graphene sheets placed on different substrates.
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An atomic force microscope is used to structure a film of multilayer graphene. The resistance of the sample was measured in-situ during nanomachining a narrow trench. We found a reversible behavior in the electrical resistance which we attribute to the movement of dislocations. After several attempts also permanent changes are observed. Two theoretical approaches are presented to approximate the measured resistance.
We report low-temperature transport spectroscopy of a graphene quantum dot fabricated by atomic force microscope nanolithography. The excellent spatial resolution of the atomic force microscope allows us to reliably fabricate quantum dots with short constrictions of less than 15 nm in length. Transport measurements demonstrate that the device is dominated by a single quantum dot over a wide gate range. The electron spin system of the quantum dot is investigated by applying an in-plane magnetic field. The results are consistent with a Lande g-factor of 2 but no regular spin filling sequence is observed, most likely due to disorder.
We present results of Niobium based SQUID magnetometers for which the weak-links are engineered by the local oxidation of thin films using an Atomic Force Microscope (AFM). Firstly, we show that this technique allows the creation of variable thickness bridges with 10 nm lateral resolution. Precise control of the weak-link milling is offered by the possibility to realtime monitor weak-link conductance. Such a process is shown to enhance the magnetic field modulation hence the sensitivity of the magnetometer. Secondly, AFM lithography is used to provide a precise alignment of NanoSQUID weak-links with respect to a ferromagnetic iron dot. The magnetization switching of the near-field coupled particle is studied as a junction of the applied magnetic field direction.
Patterning graphene into various mesoscopic devices such as nanoribbons, quantum dots, etc. by lithographic techniques has enabled the guiding and manipulation of graphenes Dirac-type charge carriers. Graphene, with well-defined strain patterns, holds promise of similarly rich physics while avoiding the problems created by the hard to control edge configuration of lithographically prepared devices. To engineer the properties of graphene via mechanical deformation, versatile new techniques are needed to pattern strain profiles in a controlled manner. Here we present a process by which strain can be created in substrate supported graphene layers. Our atomic force microscope-based technique opens up new possibilities in tailoring the properties of graphene using mechanical strain.
We present a fabrication method of superconducting quantum interference devices (SQUIDs) based on direct write lithography with an Atomic Force Microscope (AFM). This technique involves maskless local anodization of Nb or NbN ultrathin films using the voltage biased tip of the AFM. The SQUIDs are of weak-link type, for which two geometries have been tested: Dayem and variable thickness nanobridges. The magnetic field dependence of the maximum supercurrent Ic(flux) in resulting SQUIDs is thoroughly measured for different weak link geometries and for both tested materials. It is found that the modulation shape and depth of Ic(flux) curves are greatly dependent on the weak link size. We analyze the results taking into account the kinetic inductance of nanobridges and using the Likharev-Yakobson model. Finally we show that the present resolution reached by this technique (20nm) enables us to fabricate Nb weak-links which behavior approaches those of ideal Josephson junctions.
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