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Register a new userInfluence of the L21 ordering degree on the magnetic properties in Co2MnSi Heusler films
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We report on the influence of the improved L21 ordering degree on the magnetic properties of Co2MnSi Heusler films. Different fractions of the L21 phase are obtained by different post-growth annealing temperatures ranging from 350 degC to 500 degC. Room temperature magneto-optical Kerr effect measurements reveal an increase of the coercivity at an intermediate annealing temperature of 425 degC, which is a fingerprint of an increased number of pinning centers at this temperature. Furthermore, Brillouin light scattering studies show that the improvement of the L21 order in the Co2MnSi films is correlated with a decrease of the saturation magnetization by about 9%. The exchange stiffness constant of Co2MnSi, however, increases by about 8% when the L21 order is improved. Moreover, we observe a drop of the cubic anisotropy constant K1 by a factor of 10 for an increasing amount of the L21 phase.
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We have used oxygen ions irradiation to generate controlled structural disorder in thin manganite films. Conductive atomic force microscopy CAFM), transport and magnetic measurements were performed to analyze the influence of the implantation process in the physical properties of the films. CAFM images show regions with different conductivity values, probably due to the random distribution of point defect or inhomogeneous changes of the local Mn3+/4+ ratio to reduce lattice strains of the irradiated areas. The transport and magnetic properties of these systems are interpreted in this context. Metal-insulator transition can be described in the frame of a percolative model. Disorder increases the distance between conducting regions, lowering the observed TMI. Point defect disorder increases localization of the carriers due to increased disorder and locally enhanced strain field. Remarkably, even with the inhomogeneous nature of the samples, no sign of low field magnetoresistance was found. Point defect disorder decreases the system magnetization but doesn t seem to change the magnetic transition temperature. As a consequence, an important decoupling between the magnetic and the metal-insulator transition is found for ion irradiated films as opposed to the classical double exchange model scenario.
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We report the deposition of thin Co$_2$FeSi films by RF magnetron sputtering. Epitaxial (100)-oriented and L2$_1$ ordered growth is observed for films grown on MgO(100) substrates. (110)-oriented films on Al$_2$O$_3$(110) show several epitaxial domains in the film plane. Investigation of the magnetic properties reveals a saturation magnetization of 5.0 $mu_B/f.u.$ at low temperatures. The temperature dependence of the resistivity $rho_{xx}(T)$ exhibits a crossover from a T^3.5 law at T<50K to a T^1.65 behaviour at elevated temperatures. $rho_{xx}(H)$ shows a small anisotropic magnetoresistive effect. A weak dependence of the normal Hall effect on the external magnetic field indicates the compensation of electron and hole like contributions at the Fermi surface.
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