Emittance exchange beamlines employ transverse masks to create drive and witness beams of variable longitudinal profile and bunch spacing. Recently, this approach has been used to create advanced driver profiles and demonstrate record-breaking plasma wakefield transformer ratios [Roussel, R., et al., Phys. Rev. Lett. 124, 044802 (2020)], a crucial advancement for efficient witness acceleration. However, since the transverse masks are individually laser cut and installed into the UHV beamline, refinement of the beam profiles is not possible without replacing masks. Instead, this work proposes the use of a UHV compatible multileaf collimator as a beam mask. Such a device permits real-time adjustment of the electron distribution, permitting greater refinement in a manner highly synergistic with machine learning. Beam dynamics simulations have shown that a practically realizable multileaf collimator can offer resolution that is functionally equivalent to that offered by laser cut masks.
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