A single-photon CMOS image sensor design based on pinned photodiode (PPD) with multiple charge transfers and sampling is described. In the proposed pixel architecture, the photogenerated signal is sampled non-destructively multiple times and the results are averaged. Each signal measurement is statistically independent and by averaging the electronic readout noise is reduced to a level where single photons can be distinguished reliably. A pixel design using this method has been simulated in TCAD and several layouts have been generated for a 180 nm CMOS image sensor process. Using simulations, the noise performance of the pixel has been determined as a function of the number of samples, sense node capacitance, sampling rate, and transistor characteristics. The strengths and the limitations of the proposed design are discussed in detail, including the trade-off between noise performance and readout rate and the impact of charge transfer inefficiency. The projected performance of our first prototype device indicates that single-photon imaging is within reach and could enable ground-breaking performance in many scientific and industrial imaging applications.
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