We study the generalized Youngs double-slit interference for the beam produced in the spontaneously parametric down-conversion (SPDC). We find that the sub-wavelength lithography can occur macroscopically in both the two-photon intensity measurement and the single-photon spatial intensity correlation measurement. We show the visibility and the strength of the interference fringe related to the SPDC interaction. It may provide a strong quantum lithography with a moderate visibility in practical application.
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