Thin uniform arsenic targets suitable for high-fidelity cross section measurements in stacked-target experiments were prepared by electrodeposition of arsenic on titanium backings from aqueous solutions. Electrolytic cells were constructed and capable of arsenic deposits ranging in mass from approximately 1 to 29 mg (0.32-7.22 mg/cm$^2$, 0.57-12.62 $mu$m). Examination of electrodeposit surface morphology by scanning electron microscopy and microanalysis was performed to investigate the uniformity of produced targets. Brief studies of plating growth dynamics and structural properties through cyclic voltammetry were also undertaken. An alternative target fabrication approach by vapor deposition was additionally conducted. We further introduce a non-destructive characterization method for thin targets by neutron activation, which is independent of neutron flux shape, environmental factors, and source geometry, while correcting for any potential scatter or absorption effects.
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