A novel technique is reported to improve the resolution of two-photon direct laser writing lithography. Thanks to the high collimation enabled by extraordinary $varepsilon_{NZ}$ (near-zero) metamaterial features, ultra-thin dielectric hyper resolute nanostructures are within reach. With respect to the standard direct laser writing approach, a size reduction of $89%$ and $50%$ , in height and width respectively, is achieved with the height of the structures adjustable between 5nm and 50nm. The retrieved 2D fabrication parameters are exploited for fabricating hyper resolute 3D structures. In particular, a highly detailed dielectric bas-relief (500 nm of full height) of Da Vincis textit{Lady with an Ermine} has been realized. The proof-of-concept result shows intriguing cues for the current and trendsetting research scenario in anti-counterfeiting applications, flat optics and photonics.
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