Surface structures of tellurium on Si(111)-(7x7) studied by low-energy electron diffraction and scanning tunneling microscopy

The Te-covered Si(111) surface has received recent interest as a template for the epitaxy of van der Waals (vdW) materials, e.g. Bi$_2$Te$_3$. Here, we report the formation of a Te buffer layer on Si(111)$-$(7$times$7) by low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). While deposition of several monolayer (ML) of Te on the Si(111)$-$(7$times$7) surface at room temperature results in an amorphous Te layer, increasing the substrate temperature to $770rm,K$ results in a weak (7$times$7) electron diffraction pattern. Scanning tunneling microscopy of this surface shows remaining corner holes from the Si(111)$-$(7$times$7) surface reconstruction and clusters in the faulted and unfaulted halves of the (7$times$7) unit cells. Increasing the substrate temperature further to $920rm,K$ leads to a Te/Si(111)$-(2sqrt3times2sqrt{3})rm R30^{circ}$ surface reconstruction. We find that this surface configuration has an atomically flat structure with threefold symmetry.