We report on the realization of silicon nitride membranes with enhanced and electrically tunable reflectivity. A subwavelength one-dimensional grating is directly patterned on a suspended 200 nm-thick, high stress commercial film using electron beam lithography. A Fano resonance is observed in the transmission spectrum of TM polarized light impinging on the membrane at normal incidence, leading to an increase in its reflectivity from 10% to 78% at 937 nm. The observed spectrum is compared to the results of rigorous coupled wave analysis simulations based on measurements of the grating transverse profile through localized cuts of the suspended film with a Focused Ion Beam. By mounting the membrane chip on a ring piezoelectric transducer and applying a compressive force to the substrate we subsequently observe a shift of the transmission spectrum by 0.23 nm.
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