Nanomechanical resonators have demonstrated great potential for use as versatile tools in a number of emerging quantum technologies. For such applications, the performance of these systems is restricted by the decoherence of their fragile quantum states, necessitating a thorough understanding of their dissipative coupling to the surrounding environment. In bulk amorphous solids, these dissipation channels are dominated at low temperatures by parasitic coupling to intrinsic two-level system (TLS) defects, however, there remains a disconnect between theory and experiment on how this damping manifests in dimensionally-reduced nanomechanical resonators. Here, we present an optomechanically-mediated thermal ringdown technique, which we use to perform simultaneous measurements of the dissipation in four mechanical modes of a cryogenically-cooled silicon nanoresonator, with resonant frequencies ranging from 3 - 19 MHz. Analyzing the devices mechanical damping rate at fridge temperatures between 10 mK - 10 K, we demonstrate quantitative agreement with the standard tunneling model for TLS ensembles confined to one dimension. From these fits, we extract the defect density of states ($P_0 sim$ 1 - 4 $times$ 10$^{44}$ J$^{-1}$ m$^{-3}$) and deformation potentials ($gamma sim$ 1 - 2 eV), showing that each mechanical mode couples on average to less than a single thermally-active defect at 10 mK.
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