We experimentally demonstrate the use of subwavelength optical nanoantennae to assist the gentle ablation of nanostructures directly using ultralow fluence from a Ti: sapphire oscillator through the excitation of surface plasmon waves. We show that this ablation mechanism is the same for metal and dielectric. The analytical solutions of ablation threshold are in excellent agreement with the experiment estimations. Surface plasmon assisted locally enhanced ablation at nanoscale provides a method for nanomachining, manipulation and modification the nanostructures without collateral thermal damage to the materials. It is also shown that this ablation can deposit low-density high quality thin nano film.
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