For injection of beams into circular machines with different horizontal and vertical emittance acceptance, the injection efficiency can be increased if these beams are flat, i.e. if they feature unequal transverse emittances. Generation of flat electron beams is well known and has been demonstrated already in beam experiments. It was proposed also for ion beams that were generated in an Electron Cyclotron-Resonance (ECR) source. We introduce an extension of the method to beams that underwent charge state stripping without requiring their generation inside an ECR source. Results from multi-particle simulations are presented to demonstrate the validity of the method.
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