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تسجيل مستخدم جديدBeam power scale-up in MEMS based multi-beam ion accelerators
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We report on the development of multi-beam RF linear ion accelerators that are formed from stacks of low cost wafers and describe the status of beam power scale-up using an array of 120 beams. The total argon ion current extracted from the 120-beamlet extraction column was 0.5 mA. The measured energy gain in each RF gap reached as high as 7.25 keV. We present a path of using this technology to achieve ion currents >1 mA and ion energies >100 keV for applications in materials processing.
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We report on the development of a radio frequency (RF) linear accelerator (linac) for multiple-ion beams that is made from stacks of low cost wafers. The accelerator lattice is comprised of RF-acceleration gaps and electrostatic quadrupole focusing e
lements that are fabricated on 10-cm wafers made from printed circuit board or silicon. We demonstrate ion acceleration with an effective gradient of about 0.5 MV per meter with an array of 3 by 3 beams. The total ion beam energies achieved to date are in the 10 keV range with total ion currents in tests with noble gases of ~0.1mA. We discuss scaling of the ion energy (by adding acceleration modules) and ion currents (with more beams) for applications of this multi-beam RF linac technology to ion implantation and surface modification of materials.
Electron beam ion sources (EBISs) are ion sources that work based on the principle of electron impact ionization, allowing the production of very highly charged ions. The ions produced can be extracted as a DC ion beam as well as ion pulses of differ
ent time structures. In comparison to most of the other known ion sources, EBISs feature ion beams with very good beam emittances and a low energy spread. Furthermore, EBISs are excellent sources of photons (X-rays, ultraviolet, extreme ultraviolet, visible light) from highly charged ions. This chapter gives an overview of EBIS physics, the principle of operation, and the known technical solutions. Using examples, the performance of EBISs as well as their applications in various fields of basic research, technology and medicine are discussed.
The fast beam-ion instability (FII) is caused by the interaction of an electron bunch train with the residual gas ions. The ion oscillations in the potential well of the electron beam have an inherent frequency spread due to the nonlinear profile of
the potential. However, this frequency spread and associated with it Landau damping typically is not strong enough to suppress the instability. In this work, we develop a model of FII which takes into account the frequency spread in the electron beam due to the beam-beam interaction in an electron-ion collider. We show that with a large enough beam-beam parameter the fast ion instability can be suppressed. We estimate the strength of this effect for the parameters of the eRHIC electron-ion collider.
Accelerator-based light sources such as storage rings and free-electron lasers use relativistic electron beams to produce intense radiation over a wide spectral range for fundamental research in physics, chemistry, materials science, biology and medi
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An active plasma lens focuses the beam in both the horizontal and vertical planes simultaneously using a magnetic field generated by a discharge current through the plasma. A beam size of 5--10 $mu$m can be achieved using an focusing gradient on the
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