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تسجيل مستخدم جديدMulti-beam RF accelerators for ion implantation
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We report on the development of a radio frequency (RF) linear accelerator (linac) for multiple-ion beams that is made from stacks of low cost wafers. The accelerator lattice is comprised of RF-acceleration gaps and electrostatic quadrupole focusing elements that are fabricated on 10-cm wafers made from printed circuit board or silicon. We demonstrate ion acceleration with an effective gradient of about 0.5 MV per meter with an array of 3 by 3 beams. The total ion beam energies achieved to date are in the 10 keV range with total ion currents in tests with noble gases of ~0.1mA. We discuss scaling of the ion energy (by adding acceleration modules) and ion currents (with more beams) for applications of this multi-beam RF linac technology to ion implantation and surface modification of materials.
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We report on the development of multi-beam RF linear ion accelerators that are formed from stacks of low cost wafers and describe the status of beam power scale-up using an array of 120 beams. The total argon ion current extracted from the 120-beamle
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