اشترك بالحزمة الذهبية واحصل على وصول غير محدود شمرا أكاديميا
تسجيل مستخدم جديدEnhancement of ultra-thin film emission using a waveguiding active layer
132
0
0.0
(
0
)
اسأل ChatGPT حول البحث
ﻻ يوجد ملخص باللغة العربية
We present a theoretical study on the impact of an active optical layer on the emission properties of an ultrathin luminescent film. While the study can be generalized to any material, we focus here on a simple layered medium composed of a conjugated polymers (CPs) thin film, a zinc oxide layer (ZnO) and a sapphire substrate. The study spreads throughout variable aspects including the effect of the structure parameters on the CP luminescence and radiation pattern and more specifically the influence of the absorption and emission properties of the active layer. Comparing between the passive and active layer cases, the obtained results show that an enhancement of the CP luminescence of more than 20 times can be obtained by using an optically active underlying layer. The results can be explained in terms of photon recycling where the optically active layer acts as a photon reservoir and a secondary light source for the ultra thin film. This general concept is of a special interest for ultra-trace chemosensor.
قيم البحث
اقرأ أيضاً
Zinc Oxide thin films were grown on c-sapphire substrates using pulsed laser deposition. Pump power dependence of surface emission spectra, acquired using a quadrupled 266 nm laser, revealed room temperature stimulated emission (threshold of 900 kW/c
m2). Time dependent spectral analysis plus gain measurements of single-shot, side-emission, spectra pumped with a nitrogen laser revealed random lasing indicative of the presence of self-forming laser cavities. It is suggested that random lasing in an epitaxial system rather than a 3-dimensional configuration of disordered scattering elements, was due to waveguiding in the film. Waveguiding causes light to be amplified within randomly-formed closed-loops acting as lasing cavities.
We reported here a high-performance In2O3/InZnO bilayer metal-oxide (BMO) thin-film transistor (TFT) using ultra-thin solution-processed ZrOx dielectric. A thin layer of In2O3 offers a higher carrier concentration, thereby maximizing the charge accum
ulation and yielding high carrier mobility. A thick layer of InZnO controls the charge conductance resulting in low off-state current and suitable threshold voltage. As a consequence, the BMO TFT showed higher filed-effect mobility (37.9 cm2/V s) than single-layer InZnO TFT (7.6 cm2/V s). More importantly, an on/off current ratio of 109, a subthreshold swing voltage of 120 mV/decade, as well as a threshold voltage shift (less than 0.4 V) under bias stress for 2.5 hours were obtained simultaneously. These promising properties are obtained at a low operation voltage of 3 V. This work demonstrates that the BMO TFT has great potential applications as switching transistor and low-power devices.
The direct magnetoelectric (ME) effect resulting from the polarization changes induced in a ferroelectric film by the application of a magnetic field to a ferromagnetic substrate is described using the nonlinear thermodynamic theory. It is shown that
the ME response strongly depends on the initial strain state of the film. The ME polarization coefficient of the heterostructures involving Terfenol-D substrates and compressively strained lead zirconate titanate (PZT) films, which stabilize in the out-of-plane polarization state, is found to be comparable to that of bulk PZT/Terfenol-D laminate composites. At the same time, the ME voltage coefficient reaches a giant value of 50 V/(cm Oe), which greatly exceeds the maximum observed static ME coefficients of bulk composites. This remarkable feature is explained by a favorable combination of considerable strain sensitivity of polarization and a low electric permittivity in compressively strained PZT films. The theory also predicts a further dramatic increase of ME coefficients at the strain-induced transitions between different ferroelectric phases.
In terms of mixing graded TiO2 and SnO2 powders by solid-state reaction method, ITO was prepared. Using electron beam gun technology, ITO films with different thicknesses were prepared. The influence of film thickness on structure, electrical and opt
ical properties was studied. The XRD patterns were utilized to determine the structural parameters (lattice strain and crystallite size) of ITO with different thicknesses. It is observed that the average crystallite size increases as the film thickness increases, but the lattice strain decreases. SEM shows that as the film thickness increases, the grain size of ITO increases and improves. The electrical properties of ITO films with different thicknesses were measured by the standard four-point probe method. It can be seen that as the thickness of the ITO film increases from 75 nm to 325 nm, the resistivity decreases from 29x10^-4 Ohm/cm to 1.65x10^-4 Ohm/cm. This means that ITO films with lower electrical properties will be more suitable for high-efficiency CdTe solar cells. Three optical layer models (adhesive layer of the substrate/B-spline layer of ITO film/surface roughness layer) are used to calculate the film thickness with high-precision ellipsometry. In the higher T(lambda) and R(lambda) absorption regions, the absorption coefficient is determined to calculate the optical energy gap, which increases from 3.56 eV to 3.69 eV. Finally, the effects of ITO layers of various thicknesses on the performance of CdS/CdTe solar cells are also studied. When the thickness of the ITO window layer is 325 nm, Voc = 0.82 V, Jsc = 17 mA/cm2, and FF = 57.4%, the highest power conversion efficiency (PCE) is 8.6%.
We report on very high enhancement of thin layers absorption through band-engineering of a photonic crystal structure. We realized amorphous silicon (aSi) photonic crystals, where slow light modes improve absorption efficiency. We show through simula
tion that an increase of the absorption by a factor of 1.5 is expected for a film of aSi. The proposal is then validated by an experimental demonstration, showing an important increase of the absorption of a layer of aSi over a spectral range of 0.32-0.76 microns.
سجل دخول لتتمكن من نشر تعليقات
التعليقات
جاري جلب التعليقات
سجل دخول لتتمكن من متابعة معايير البحث التي قمت باختيارها
