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The highly advanced treatment of surfaces as etching and deposition is mainly enabled by the extraordinary properties of technological plasmas. The primary factors that influence these processes are the flux and the energy of various species, particularly ions, that impinge the substrate surface. These features can be theoretically described using the ion energy distribution function (IEDF). The article is intended to summarize the fundamental concepts of modeling and simulation of IEDFs from simplified models to self-consistent plasma simulations. Finally, concepts for controlling the IEDF are discussed.
We propose a method to generate a single peak at a distinct energy in the ion flux-energy distribution function (IDF) at the electrode surfaces in capacitively coupled plasmas. The technique is based on the tailoring of the driving voltage waveform,
The effect of a magnetic field on the characteristics of capacitively coupled radio frequency discharges is investigated and found to be substantial. A one-dimensional particle-in-cell simulation shows that geometrically symmetric discharges can be a
This article illustrates how very small deviations from the Maxwellian exponential tail, while leaving unchanged bulk quantities, can yield dramatic effects on fusion reaction rates and discuss several mechanisms that can cause such deviations.
A numerical tool for analysing spatially anisotropic electron populations in electron cyclotron resonance (ECR) plasmas has been developed, using a trial-and-error electron energy distribution function (EEDF) fitting method. The method has been teste
Solid-density plasmas driven by intense x-ray free-electron laser (XFEL) radiation are seeded by sources of non-thermal photoelectrons and Auger electrons that ionize and heat the target via collisions. Simulation codes that are commonly used to mode