A Kinetic Monte Carlo model that simulates the growth of thin films under conditions typically encountered in plasma enhanced chemical vapor deposition experiments is presented. The model is intended to reproduce the growth of two different types of materials (amorphous nanocolumnar and anisotropic-polycrystalline) in a coarse-grained fashion. In order to show the advantages and limitations of the model, the microstructure, texture, and scaling properties of TiO2 and ZnO thin-film growth are obtained under several growth conditions and compared with available experimental data obtained by X-Ray Diffraction, analysis of texture coefficients, Atomic Force Microscopy and Scanning Electron Microscopy.
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