Optical interference is used to enhance light-matter interaction and harvest broadband light in ultrathin semiconductor absorber films on specular back-reflectors. However, the high-temperature processing in oxygen atmosphere required for oxide absorbers often degrades metallic back-reflectors and their specular reflectance. In order to overcome this problem, we present a newly developed film flip and transfer process that allows for high-temperature processing without degradation of the metallic back-reflector and without the need of passivation interlayers. The film flip and transfer process improves the performance of photoanodes for photoelectrochemical water splitting comprising ultrathin (< 20 nm) hematite (Fe2O3) films on silver-gold alloy (90 at% Ag-10 at% Au) back-reflectors. We obtain specular back-reflectors with high reflectance below hematite films, which is necessary for maximizing the productive light absorption in the hematite film and minimizing non-productive absorption in the back-reflector. Furthermore, the film flip and transfer process opens up a new route to attach thin film stacks onto a wide range of substrates including flexible or temperature sensitive materials.
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