Bi-Arrhenius diffusion and surface trapping of $^{8}$Li$^{+}$ in rutile TiO$_2$


Abstract in English

We report measurements of the diffusion rate of isolated ion-implanted $^{8}$Li$^{+}$ within $sim$120 nm of the surface of oriented single-crystal rutile TiO$_2$ using a radiotracer technique. The $alpha$-particles from the $^{8}$Li decay provide a sensitive monitor of the distance from the surface and how the depth profile of $^{8}$Li evolves with time. The main findings are that the implanted Li$^{+}$ diffuses and traps at the (001) surface. The T-dependence of the diffusivity is described by a bi-Arrhenius expression with activation energies of 0.3341(21) eV above 200 K, whereas at lower temperatures it has a much smaller barrier of 0.0313(15) eV. We consider possible origins for the surface trapping, as well the nature of the low-T barrier.

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