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Register a new userHigh-quality GeV-scale electron bunches with the Resonant Multi-Pulse Ionization Injection
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Recently a new injection scheme for Laser Wake Field Acceleration, employing a single 100-TW-class laser system, has been proposed. In the Resonant Multi-Pulse Ionization injection (ReMPI) a resonant train of pulses drives a large amplitude plasma wave that traps electrons extracted from the plasma by further ionization of a high-Z dopant (Argon in the present paper). While the pulses of the driver train have intensity below the threshold for the dopants ionization, the properly delayed and frequency doubled (or more) ionization pulse possesses an electric field large enough to extract electrons, though its normalized amplitude is well below unity. In this paper we will report on numerical simulations results aimed at the generation of GeV-scale bunches with normalized emittance and {it rms} energy below $80, nm times rad $ and $0.5, %$, respectively. Analytical consideration of the FEL performance for a $1.3, GeV$ bunch will be also reported.
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Autoresonance laser acceleration of electrons is theoretically investigated using circularly polarized focused Gaussian pulses. Many-particle simulations demonstrate feasibility of creating over 10-GeV electron bunches of ultra-high quality (relative energy spread of order 10^-4), suitable for fundamental high-energy particle physics research. The laser peak intensities and axial magnetic field strengths required are up to about 10^18 W/cm^2 (peak power ~10 PW) and 60 T, respectively. Gains exceeding 100 GeV are shown to be possible when weakly focused pulses from a 200-PW laser facility are used.
The production of high-quality electron bunches in Laser Wake Field Acceleration relies on the possibility to inject ultra-low emittance bunches in the plasma wave. In this paper we present a new bunch injection scheme in which electrons extracted by ionization are trapped by a large-amplitude plasma wave driven by a train of resonant ultrashort pulses. In the REsonant Multi-Pulse Ionization (REMPI) injection scheme, the main portion of a single ultrashort (e.g Ti:Sa) laser system pulse is temporally shaped as a sequence of resonant sub-pulses, while a minor portion acts as an ionizing pulse. Simulations show that high-quality electron bunches with normalized emittance as low as $0.08$ mm$times$mrad and $0.65%$ energy spread can be obtained with a single present-day 100TW-class Ti:Sa laser system.
The production of ultra-bright electron bunches using ionization injection triggered by two transversely colliding laser pulses inside a beam-driven plasma wake is examined via three-dimensional (3D) particle-in-cell (PIC) simulations. The relatively low intensity lasers are polarized along the wake axis and overlap with the wake for a very short time. The result is that the residual momentum of the ionized electrons in the transverse plane of the wake is much reduced and the injection is localized along the propagation axis of the wake. This minimizes both the initial thermal emittance and the emittance growth due to transverse phase mixing. 3D PIC simulations show that ultra-short (around 8 fs) high-current (0.4 kA) electron bunches with a normalized emittance of 8.5 and 6 nm in the two planes respectively and a brightness greater than 1.7*10e19 A rad-2 m-2 can be obtained for realistic parameters.
The proposal of generating high quality electron bunches via ionization injection triggered by an counter propagating laser pulse inside a beam driven plasma wake is examined via two-dimensional particle-in-cell simulations. It is shown that electron bunches obtained using this technique can have extremely small slice energy spread, because each slice is mainly composed of electrons ionized at the same time. Another remarkable advantage is that the injection distance is changeable. A bunch with normalized emittance of 3.3 nm, slice energy spread of 15 keV and brightness of $7.2times 10^{18}$ A m$^{-2}$ rad$^{-2}$ is obtained with an optimal injection length which is achieved by adjusting the launch time of the drive beam or by changing the laser focal position. This makes the scheme a promising approach to generate high quality electron bunches for the fifth generation light source.
A method is proposed to generate low emittance electron bunches from two color laser pulses in a laser-plasma accelerator. A two-region gas structure is used, containing a short region of a high-Z gas (e.g., krypton) for ionization injection, followed by a longer region of a low-Z gas for post-acceleration. A long-laser-wavelength (e.g., 5 micron) pump pulse excites plasma wake without triggering the inner-shell electron ionization of the high-Z gas due to low electric fields. A short-laser-wavelength (e.g., 0.4 micron) injection pulse, located at a trapping phase of the wake, ionizes the inner-shell electrons of the high-Z gas, resulting in ionization-induced trapping. Compared with a single-pulse ionization injection, this scheme offers an order of magnitude smaller residual transverse momentum of the electron bunch, which is a result of the smaller vector potential amplitude of the injection pulse.
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