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Register a new userMetal Insulator transition in tin doped indium oxide (ITO) thin films Quantum Correction to the electrical Conductivity
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Added by
Udaykumar Khanapuram
Publication date
2016
fields
Physics
and research's language is
English
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Tin doped indium oxide (ITO) thin films are being used extensively as transparent conductors in several applications. In the present communication, we report the electrical transport in DC magnetron sputtered ITO thin films in low temperatures (25-300 K). The low temperature Hall effect and resistivity measurements reveal that the ITO thin films are moderately dis-ordered (kfl~1) and degenerate semiconductor. The transport of charge carriers in these disordered ITO thin films takes place via the de-localized states. The disorder effects lead to the well- known metal-insulator transition; this transition is observed at 110 K in ITO thin films. The metal-insulator behaviour is explained by the quantum correction to the conductivity (QCC); this approach is based on the quantum-mechanical interference effects in the disordered systems. The insulating behaviour is attributed to the combined effect of the weak localization and the electron-electron interactions.
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We present a detailed study of the emergence of bulk ferromagnetism in low carrier density samples of undoped indium tin oxide (ITO). We used annealing to increase the density of oxygen vacancies and change sample morphology without introducing impurities through the metal insulator transition (MIT). We utilized a novel and highly sensitive Corbino-disk torque magnetometry technique to simultaneously measure the thermodynamic and transport effects of magnetism on the same sample after successive annealing. With increased sample granularity, carrier density increased, the sample became more metallic, and ferromagnetism appeared as resistance approached the MIT. Ferromagnetism was observed through the detection of magnetization hysteresis, anomalous Hall effect (AHE), and hysteretic magnetoresistance. A sign change of the AHE as the MIT is approached may elucidate the interplay between the impurity band and the conduction band in the weakly insulating side of the MIT.
We observe an insulator-to-metal (I-M) transition in crystalline silicon doped with sulfur to non- equilibrium concentrations using ion implantation followed by pulsed laser melting and rapid resolidification. This I-M transition is due to a dopant known to produce only deep levels at equilibrium concentrations. Temperature-dependent conductivity and Hall effect measurements for temperatures T > 1.7 K both indicate that a transition from insulating to metallic conduction occurs at a sulfur concentration between 1.8 and 4.3 x 10^20 cm-3. Conduction in insulating samples is consistent with variable range hopping with a Coulomb gap. The capacity for deep states to effect metallic conduction by delocalization is the only known route to bulk intermediate band photovoltaics in silicon.
We report on the influence of the chemical composition on the electronic properties of molybdenum oxynitrides thin films grown by reactive sputtering on Si (100) substrates at room temperature. The partial pressure of Ar was fixed at 90 %, and the remaining 10 % was adjusted with mixtures N$_2$:O$_2$ (varying from pure N$_2$ to pure O$_2$). The crystalline and electronic structures and the electrical transport of the films depend on the chemical composition. Thin films grown using oxygen mixtures up 2 % have gamma-Mo$_2$N phase and display superconductivity. The superconducting critical temperature T$_c$ reduces from ~ 6.8 K to below 3.0 K as the oxygen increases. On the other hand, films grown using oxygen mixtures richer than 2 % are mostly amorphous. The electrical transport shows a semiconductor-like behavior with variable-range hopping conduction at low temperatures. The analysis of the optical properties reveals that the samples have not a defined semiconductor band gap, which can be related to the high structural disorder and the excitation of electrons in a wide range of energies
We demonstrate control of the carrier density of single phase anatase TiO2 thin films by nearly two orders of magnitude by modulating the growth kinetics during pulsed laser deposition, under fixed thermodynamic conditions. The resistivity and the intensity of the photoluminescence spectra of these TiO2 samples, both of which correlate with the number of oxygen vacancies, are shown to depend strongly on the growth rate. A quantitative model is used to explain the carrier density changes.
In the perovskite oxide SrCrO$_{3}$ the interplay between crystal structure, strain and orbital ordering enables a transition from a metallic to an insulating electronic structure under certain conditions. We identified a narrow window of oxygen partial pressure in which highly strained SrCrO$_{3}$ thin films can be grown using radio-frequency (RF) off-axis magnetron sputtering on three different substrates, (LaAlO$_{3}$)$_{0.3}$-(Sr$_{2}$TaAlO$_{6}$)$_{0.7}$ (LSAT), SrTiO$_{3}$ (STO) and DyScO$_{3}$ (DSO). X-ray diffraction and atomic force microscopy confirmed the quality of the films and a metal-insulator transition driven by the substrate induced strain was demonstrated.
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