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Register a new userReversible Basal Plane Hydrogenation of Graphene
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We report the chemical reaction of single-layer graphene with hydrogen atoms, generated in situ by electron-induced dissociation of hydrogen silsesquioxane (HSQ). Hydrogenation, forming sp3 C-H functionality on the basal plane of graphene, proceeds at a higher rate for single than for double layers, demonstrating the enhanced chemical reactivity of single sheet graphene. The net H atom sticking probability on single layers at 300 K is at least 0.03, which exceeds that of double layers by at least a factor of 15. Chemisorbed hydrogen atoms, which give rise to a prominent Raman D band, can be detached by thermal annealing at 100~200 degrees C. The resulting dehydrogenated graphene is activated when photothermally heated it reversibly binds ambient oxygen, leading to hole doping of the graphene. This functionalization of graphene can be exploited to manipulate electronic and charge transport properties of graphene devices.
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Graphene is of interest in the development of next-generation electronics due to its high electron mobility, flexibility and stability. However, graphene transistors have poor on/off current ratios because of the absence of a bandgap. One approach to introduce an energy gap is to use hydrogenation reaction, which changes graphene into insulating graphane with sp3 bonding. Here we show that an electric field can be used to control conductor-to-insulator transitions in microscale graphene via a reversible electrochemical hydrogenation in an organic liquid electrolyte containing dissociative hydrogen ions. The fully hydrogenated graphene exhibits a lower limit sheet resistance of 200 Gohm/sq, resulting in graphene field-effect transistors with on/off current ratios of 10^8 at room temperature. The devices also exhibit high endurance, with up to one million switching cycles. Similar insulating behaviours are also observed in bilayer graphene, while trilayer graphene remains highly conductive after the hydrogenation. Changes in the graphene lattice, and the transformation from sp2 to sp3 hybridization, is confirmed by in-situ Raman spectroscopy, supported by first-principles calculations.
Hydrogen, the smallest and most abundant element in nature, can be efficiently incorporated within a solid and drastically modify its electronic state - it has been known to induce novel magnetoelectric effects in complex perovskites and modulate insulator-to-metal transition in a correlated Mott oxide. Here we demonstrate that hydrogenation resolves an outstanding challenge in chalcogenide classes of three-dimensional (3D) topological insulators and magnets - the control of intrinsic bulk conduction that denies access to quantum surface transport. With electrons donated by a reversible binding of H+ ions to Te(Se) chalcogens, carrier densities are easily changed by over 10^20 cm^-3, allowing tuning the Fermi level into the bulk bandgap to enter surface/edge current channels. The hydrogen-tuned topological materials are stable at room temperature and tunable disregarding bulk size, opening a breadth of platforms for harnessing emergent topological states.
We report on the synthesis of CdSe quantum dots on a graphene surface by an electrochemical deposition method. By using a mesoporous silica film formed on the graphene surface as a template and a potential equalizer between the edge/defect sites and the basal plane of the graphene, CdSe quantum dots can be grown on the basal plane into a regular hexagonal array.
Electronic properties of the graphene layer sandwiched between two hexagonal boron nitride sheets have been studied using the first-principles calculations and the minimal tight-binding model. It is shown that for the ABC-stacked structure in the absence of external field the bands are linear in the vicinity of the Dirac points as in the case of single-layer graphene. For certain atomic configuration, the electric field effect allows opening of a band gap of over 230 meV. We believe that this mechanism of energy gap tuning could significantly improve the characteristics of graphene-based field-effect transistors and pave the way for future electronic applications.
An Ising model with competing interaction is used to study the appearance of incommensurate phases in the basal plane of an hexagonal closed-packed structure. The calculated mean-field phase diagram reveals various 1q-incommensurate and lock-in phases. The results are applied to explain the basal-plane incommensurate phase in some compounds of the AABX_4 family, like K_2MoO_4, K_2WO_4, Rb_2WO4 and to describe the sequence of high-temperature phase transitions in other compounds of this family.
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