Auger Electron Spectroscopy of ZnO Films


Abstract in English

A study of surface chemical composition has been performed by using Auger Electron Spectroscopy (AES) for ZnO layers grown by Atomic Layer Deposition (ALD) procedure.Elements on surface of materials were identified,and, an atomic concentration of elements on surface was determinate. Onlysmall amount of carbon or carbon compounds detected, easily removed by argon ion sputtering. Also, long argon ion sputtering partly depleted surface of oxygen.

References used

(Janotti Anderson and Van de Walle Chris G. Fundamentals of zinc oxide as a Semiconductor. Rep. Prog. Phys. 72, 2009, 126501 (1-29
(A. R. Chourasia and D. R. Chopra. Handbook of Instrumental Techniques for Analytical Chemistry, Auger Electron Spectroscopy. Texas A&M University–Commerce, 1995, (791–808
(McGuire, E. G. Handbook of Auger Electron Spectroscopy, Plenum press, New York, 1979, (404-405

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