Hafnium oxide (HfO2)-based ferroelectrics offer remarkable promise for memory and logic devices in view of their compatibility with traditional silicon CMOS technology, high switchable polarization, good endurance and thickness scalability. These factors have led to steep rise in research on this class of materials over the past number of years. At the same time, only a few reports on the direct sensing of nanoscale ferroelectric properties exist, with many questions remaining regarding the emergence of ferroelectricity in these materials. While piezoresponse force microscopy (PFM) is ideally suited to probe piezo- and ferro-electricity on the nanoscale, it is known to suffer artifacts which complicate quantitative interpretation of results and can even lead to claims of ferroelectricity in materials which are not ferroelectric. In this paper we explore the possibility of using an improved PFM method based on interferometric displacement sensing (IDS) to study nanoscale ferroelectricity in bare Si doped HfO2. Our results indicate a clear difference in the local remnant state of various HfO2 crystallites with reported values for the piezoelectric coupling in range 0.6-1.5 pm/V. In addition, we report unusual ferroelectric polarization switching including possible contributions from electrostriction and Vegard effect, which may indicate oxygen vacancies or interfacial effects influence the emergence of nanoscale ferroelectricity in HfO2.
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