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Depressions by stacking faults in nanorippled graphene on metals

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 Added by Johann Coraux
 Publication date 2020
  fields Physics
and research's language is English




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A broad variety of defects has been observed in two-dimensional materials. Many of these defects can be created by top-down methods such as electron irradiation or chemical etching, while a few of them are created along bottom-up processes, in particular during the growth of the material, in which case avoiding their formation can be challenging. This occurs e.g. with dislocations, Stone-Wales defects, or atomic vacancies in graphene. Here we address a defect that has been observed repeatedly since 2007 in epitaxial graphene on metal surfaces like Ru(0001) and Re(0001), but whose nature has remained elusive thus far. This defect has the appearance of a vacant hill in the periodically nanorippled topography of graphene, which comes together with a moir{e} pattern. Based on atomistic simulations and scanning tunneling microscopy/spectroscopy measurements, we argue that such defects are topological in nature and that their core is a stacking fault patch, either in graphene, surrounded by loops of non-hexagonal carbon rings, or in the underlying metal. We discuss the possible origin of these defects in relation with recent reports of metastable polycyclic carbon molecules forming upon graphene growth. Like other defects, the vacant hills may be considered as deleterious in the perspective of producing high quality graphene. However, provided they can be organized in graphene, they might allow novel optical, spin, or electronic properties to be engineered.



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We study coherent backscattering phenomena from single and multiple stacking faults (SFs) in 3C- and 4H-SiC within density functional theory quantum transport calculations. We show that SFs give rise to highly dispersive bands within both the valance and conduction bands that can be distinguished for their enhanced density of states at particular wave number subspaces. The consequent localized perturbation potential significantly scatters the propagating electron waves and strongly increases the resistance for $n$-doped systems. We argue that resonant scattering from SFs should be one of the principal degrading mechanisms for device operation in silicon carbide.
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We study the effects of metallic doping on the electronic properties of graphene using density functional theory in the local density approximation in the presence of a local charging energy (LDA+U). The electronic properties are sensitive to whether graphene is doped with alkali or transition metals. We estimate the the charge transfer from a single layer of Potassium on top of graphene in terms of the local charging energy of the graphene sheet. The coating of graphene with a non-magnetic layer of Palladium, on the other hand, can lead to a magnetic instability in coated graphene due to the hybridization between the transition-metal and the carbon orbitals.
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We present out-of-plane dielectric and magnetodielectric measurements of single crystallines $alpha$-RuCl$_3$ with various degrees of stack faults. A frequency dependent, but field independent, dielectric anomaly appears at $T_{A}:(f=100:mathrm{kHz})sim$ 4 K once both magnetic transitions at $T_{N1}sim$ 7 K and $T_{N2}sim$ 14 K set in. The observed dielectric anomaly is attributed to the emergency of possible local electric polarizations whose inversion symmetry is broken by inhomogeneously distributed stacking faults. A field-induced intermediate phase is only observed when a magnetic field is applied perpendicular to the Ru-Ru bonds for samples with minimal stacking faults. Less pronounced in-plane anisotropy is found in samples with sizable contribution from stacking imperfections. Our findings suggest that dielectric measurement is a sensitive probe in detecting the structural and magnetic properties, which may be a promising tool especially in studying $alpha$-RuCl$_3$ thin film devices. Moreover, the stacking details of RuCl$_3$ layers strongly affect the ground state both in the magnetic and electric channels. Such a fragile ground state against stacking faults needs to be overcome for realistic applications utilizing the magnetic and/or electric properties of Kitaev based physics in $alpha$-RuCl$_3$.
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