Multilayer metasurfaces (MLMs) represent a versatile type of three-dimensional optical metamaterials that could enable ultra-thin and multi-functional photonic components. Herein we demonstrate an approach to readily fabricate MLMs exploiting a thin film self-rolling technique. As opposed to standard layer-by-layer approaches, all the metasurfaces are defined within a single nanopatterning step, significantly reducing fabrication time and costs. We realize two MLMs platforms relying on widely used nanopatterning techniques, namely focused ion-beam and electron-beam lithographies. A first example are MLMs comprised of nanohole patterns structured into metal-dielectric seed bilayers. The second platform is comprised of vertical stacks of angled plasmonic nanorod arrays separated by thin dielectric layers. Such angled MLMs exhibit a selective response to circularly polarized light, in agreement with previous works relying on layer-by-layer processes. Our approach can pave the way for the efficient prototyping of novel MLMs, such as devices with varying number of layers and configurations that can be fabricated on a single chip.
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