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Register a new userLocal geometry around B atoms in B/Si(111) from polarized x-ray absorption spectroscopy
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The arrangement of B~atoms in a doped Si(111)-$(sqrt{3}timessqrt{3})R30^{circ}$:B system was studied using near-edge x-ray absorption fine structure (NEXAFS). Boron atoms were deposited via segregation from the bulk by flashing the sample repeatedly. The positions of B~atoms are determined by comparing measured polarized (angle-dependent) NEXAFS spectra with spectra calculated for various structural models based on ab-initio total energy calculations. It is found that most of boron atoms are located in sub-surface L$_{1}^{c}$ positions, beneath a Si atom. However, depending on the preparation method a significant portion of B~atoms may be located elsewhere. A possible location of these non-L$_{1}^{c}$-atoms is at the surface, next to those Si atoms which form the $(sqrt{3}timessqrt{3})R30^{circ}$ reconstruction.
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A study of magnetic hysteresis and Giant magnetoimpedance (GMI) in amorphous glass covered Co-Si-B and Co-Mn-Si-B wires is presented. The wires, about 10 microns in diameter, were obtained by glass-coated melt spinning technique. Samples with positive magnetostriction (MS) have a rectangular bistable hysteresis loop. A smooth hysteresis loop is observed for wires with nearly zero MS. When MS is negative, almost no hysteresis is observed. The GMI was measured in the frequency range between 20 Hz and 30 MHz. The shapes of the impedance versus field curves are qualitatively similar to each other for both positive and zero MS samples. Impedance is maximum at zero field, and decreases sharply in the range 10-20 Oe. For the negative MS wires, when the driving current is small, the impedance is maximum at a finite external field. The position of the maximum approaches zero with increasing current. The contributions of the moment rotation and domain wall motion in the three cases are discussed.
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The electronic structure of the magnetic semiconductor Ga$_{1-x}$Cr$_{x}$N and the effect of Si doping on it have been investigated by photoemission and soft x-ray absorption spectroscopy. We have confirmed that Cr in GaN is predominantly trivalent substituting for Ga, and that Cr 3$d$ states appear within the band gap of GaN just above the N 2$p$-derived valence-band maximum. As a result of Si doping, downward shifts of the core levels (except for Cr 2$p$) and the formation of new states near the Fermi level were observed, which we attribute to the upward chemical potential shift and the formation of a small amount of Cr$^{2+}$ species caused by the electron doping. Possibility of Cr-rich cluster growth by Si doping are discussed based on the spectroscopic and magnetization data.
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