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Register a new userNature of the metal-insulator transition in few-unit-cell-thick LaNiO3 films
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The nature of the metal insulator transition in thin films and superlattices of LaNiO3 with only few unit cells in thickness remains elusive despite tremendous effort. Quantum confinement and epitaxial strain have been evoked as the mechanisms, although other factors such as growth-induced disorder, cation non-stoichiometry, oxygen vacancies, and substrate-film interface quality may also affect the observable properties in the ultrathin films. Here we report results obtained for near-ideal LaNiO3 films with different thicknesses and terminations grown by atomic layer-by-layer laser molecular beam epitaxy on LaAlO3 substrates. We find that the room-temperature metallic behavior persists until the film thickness is reduced to an unprecedentedly small 1.5 unit cells (NiO2 termination). Electronic structure measurements using x-ray absorption spectroscopy and first-principles calculation suggest that oxygen vacancies existing in the films also contribute to the metal insulator transition.
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We present a detailed study of the emergence of bulk ferromagnetism in low carrier density samples of undoped indium tin oxide (ITO). We used annealing to increase the density of oxygen vacancies and change sample morphology without introducing impurities through the metal insulator transition (MIT). We utilized a novel and highly sensitive Corbino-disk torque magnetometry technique to simultaneously measure the thermodynamic and transport effects of magnetism on the same sample after successive annealing. With increased sample granularity, carrier density increased, the sample became more metallic, and ferromagnetism appeared as resistance approached the MIT. Ferromagnetism was observed through the detection of magnetization hysteresis, anomalous Hall effect (AHE), and hysteretic magnetoresistance. A sign change of the AHE as the MIT is approached may elucidate the interplay between the impurity band and the conduction band in the weakly insulating side of the MIT.
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