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Electron Beam Ion Sources

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 Publication date 2014
  fields Physics
and research's language is English




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Electron beam ion sources (EBISs) are ion sources that work based on the principle of electron impact ionization, allowing the production of very highly charged ions. The ions produced can be extracted as a DC ion beam as well as ion pulses of different time structures. In comparison to most of the other known ion sources, EBISs feature ion beams with very good beam emittances and a low energy spread. Furthermore, EBISs are excellent sources of photons (X-rays, ultraviolet, extreme ultraviolet, visible light) from highly charged ions. This chapter gives an overview of EBIS physics, the principle of operation, and the known technical solutions. Using examples, the performance of EBISs as well as their applications in various fields of basic research, technology and medicine are discussed.



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102 - Gennady Stupakov 2019
The fast beam-ion instability (FII) is caused by the interaction of an electron bunch train with the residual gas ions. The ion oscillations in the potential well of the electron beam have an inherent frequency spread due to the nonlinear profile of the potential. However, this frequency spread and associated with it Landau damping typically is not strong enough to suppress the instability. In this work, we develop a model of FII which takes into account the frequency spread in the electron beam due to the beam-beam interaction in an electron-ion collider. We show that with a large enough beam-beam parameter the fast ion instability can be suppressed. We estimate the strength of this effect for the parameters of the eRHIC electron-ion collider.
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This chapter provides an overview of the basic requirements for ion sources designed and operated in radioactive ion beam facilities. The facilities where these sources are operated exploit the isotope separation online (ISOL) technique, in which a target is combined with an ion source to maximize the secondary beam intensity and chemical element selectivity. Three main classes of sources are operated, namely surface-type ion sources, arc discharge-type ion sources, and finally radio-frequency-heated plasma-type ion sources.
The particle-in-cell MCC code NAM-ECRIS is used to simulate the ECRIS plasma sustained in a mixture of Kr with O2, N2, Ar, Ne and He. The model assumes that ions are electrostatically confined in ECR zone by a dip in the plasma potential. Gain in the extracted krypton ion currents is seen for the highest charge states; the gain is maximized when oxygen is used as the mixing gas. A special feature of oxygen is that most of singly charged oxygen ions are produced after dissociative ionization of oxygen molecules with the large kinetic energy release of around 5 eV per ion. Increased loss rate of energetic lowly charged ions of the mixing element requires building up of the retarding potential barrier close to ECR surface to equilibrate electron and ion losses out of the plasma. In the mixed plasmas, the barrier value is large (~1 V) compared to the pure Kr plasma (~0.01 V), with the longer confinement times of krypton ions and with the much higher ion temperatures.
136 - L. Celona 2014
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