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Current-voltage characteristics of tunnel Josephson junctions with a ferromagnetic interlayer

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 Added by Andrey Vasenko
 Publication date 2011
  fields Physics
and research's language is English




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We present a quantitative study of the current-voltage characteristics (CVC) of diffusive superconductor/ insulator/ ferromagnet/ superconductor (SIFS) tunnel Josephson junctions. In order to obtain the CVC we calculate the density of states (DOS) in the F/S bilayer for arbitrary length of the ferromagnetic layer, using quasiclassical theory. For a ferromagnetic layer thickness larger than the characteristic penetration depth of the superconducting condensate into the F layer, we find an analytical expression which agrees with the DOS obtained from a self-consistent numerical method. We discuss general properties of the DOS and its dependence on the parameters of the ferromagnetic layer. In particular we focus our analysis on the DOS oscillations at the Fermi energy. Using the numerically obtained DOS we calculate the corresponding CVC and discuss their properties. Finally, we use CVC to calculate the macroscopic quantum tunneling (MQT) escape rate for the current biased SIFS junctions by taking into account the dissipative correction due to the quasiparticle tunneling. We show that the influence of the quasiparticle dissipation on the macroscopic quantum dynamics of SIFS junctions is small, which is an advantage of SIFS junctions for superconducting qubits applications.



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The dependence of the critical current density j_c on the ferromagnetic interlayer thickness d_F was determined for Nb/Al_2O_3/Cu/Ni/Nb Josephson tunnel junctions with ferromagnetic Ni interlayer from very thin film thicknesses (sim 1 nm) upwards and classified into F-layer thickness regimes showing a dead magnetic layer, exchange, exchange + anisotropy and total suppression of j_c. The Josephson coupling changes from 0 to pi as function of d_F, and -very close to the crossover thickness- as function of temperature. The strong suppression of the supercurrent in comparison to non-magnetic Nb/Al_2O_3/Cu/Nb junctions indicated that the insertion of a F-layer leads to additional interface scattering. The transport inside the dead magnetic layer was in dirty limit. For the magnetically active regime fitting with both the clean and the dirty limit theory were carried out, indicating dirty limit condition, too. The results were discussed in the framework of literature
We investigate superconductor/insulator/ferromagnet/superconductor (SIFS) tunnel Josephson junctions in the dirty limit, using the quasiclassical theory. We formulate a quantitative model describing the oscillations of critical current as a function of thickness of the ferromagnetic layer and use this model to fit recent experimental data. We also calculate quantitatively the density of states (DOS) in this type of junctions and compare DOS oscillations with those of the critical current.
We investigate heat and charge transport through a diffusive SIF1F2N tunnel junction, where N (S) is a normal (superconducting) electrode, I is an insulator layer and F1,2 are two ferromagnets with arbitrary direction of magnetization. The flow of an electric current in such structures at subgap bias is accompanied by a heat transfer from the normal metal into the superconductor, which enables refrigeration of electrons in the normal metal. We demonstrate that the refrigeration efficiency depends on the strength of the ferromagnetic exchange field h and the angle {alpha} between the magnetizations of the two F layers. As expected, for values of h much larger than the superconducting order parameter Delta, the proximity effect is suppressed and the efficiency of refrigeration increases with respect to a NIS junction. However, for h sim Delta the cooling power (i.e. the heat flow out of the normal metal reservoir) has a non-monotonic behavior as a function of h showing a minimum at h approx Delta. We also determine the dependence of the cooling power on the lengths of the ferromagnetic layers, the bias voltage, the temperature, the transmission of the tunneling barrier and the magnetization misalignment angle {alpha}.
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We present the concept of ferroelectric tunnel junctions (FTJs). These junctions consist of two metal electrodes separated by a nanometer-thick ferroelectric barrier. The current-voltage characteristics of FTJs are analyzed under the assumption that the direct electron tunneling represents the dominant conduction mechanism. First, the influence of converse piezoelectric effect inherent in ferroelectric materials on the tunnel current is described. The calculations show that the lattice strains of piezoelectric origin modify the current-voltage relationship owing to strain-induced changes of the barrier thickness, electron effective mass, and position of the conduction-band edge. Remarkably, the conductance minimum becomes shifted from zero voltage due to the piezoelectric effect, and a strain-related resistive switching takes place after the polarization reversal in a ferroelectric barrier. Second, we analyze the influence of the internal electric field arising due to imperfect screening of polarization charges by electrons in metal electrodes. It is shown that, for asymmetric FTJs, this depolarizing-field effect also leads to a considerable change of the barrier resistance after the polarization reversal. However, the symmetry of the resulting current-voltage loop is different from that characteristic of the strain-related resistive switching. The crossover from one to another type of the hysteretic curve, which accompanies the increase of FTJ asymmetry, is described taking into account both the strain and depolarizing-field effects. It is noted that asymmetric FTJs with dissimilar top and bottom electrodes are preferable for the non-volatile memory applications because of a larger resistance on/off ratio.
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