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Double quantum dot with tunable coupling in an enhancement-mode silicon metal-oxide semiconductor device with lateral geometry

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 Added by Lisa Tracy
 Publication date 2010
  fields Physics
and research's language is English




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We present transport measurements of a tunable silicon metal-oxide-semiconductor double quantum dot device with lateral geometry. Experimentally extracted gate-to-dot capacitances show that the device is largely symmetric under the gate voltages applied. Intriguingly, these gate voltages themselves are not symmetric. Comparison with numerical simulations indicates that the applied gate voltages serve to offset an intrinsic asymmetry in the physical device. We also show a transition from a large single dot to two well isolated coupled dots, where the central gate of the device is used to controllably tune the interdot coupling.



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The spin states of electrons confined in semiconductor quantum dots form a promising platform for quantum computation. Recent studies of silicon CMOS qubits have shown coherent manipulation of electron spin states with extremely high fidelity. However, manipulation of single electron spins requires large oscillatory magnetic fields to be generated on-chip, making it difficult to address individual qubits when scaling up to multi-qubit devices. The spin-orbit interaction allows spin states to be controlled with electric fields, which act locally and are easier to generate. While the spin-orbit interaction is weak for electrons in silicon, valence band holes have an inherently strong spin-orbit interaction. However, creating silicon quantum dots in which a single hole can be localised, in an architecture that is suitable for scale-up to a large number of qubits, is a challenge. Here we report a silicon quantum dot, with an integrated charge sensor, that can be operated down to the last hole. We map the spin states and orbital structure of the first six holes, and show they follow the Fock-Darwin spectrum. We also find that hole-hole interactions are extremely strong, reducing the two-hole singlet-triplet splitting by 90% compared to the single particle level spacing of 3.5 meV. These results provide a route to single hole spin quantum bits in a planar silicon CMOS architecture.
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