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Quantum Hall (QH) edge channels appear not only along the edge of the electron gas but also along an interface between two QH regions with different filling factors. However, the fundamental transport characteristics of such interface channels are not well understood, particularly in the high-frequency regime. In this study, we investigate the interface plasmon mode along the edge of a metal gate electrode with ungated and gated QH regions in both integer and fractional QH regimes using a time-resolved measurement scheme. The observed plasmon waveform was delayed and broadened due to the influence of the charge puddles formed around the channel. The charge velocity and diffusion constant of the plasmon mode were evaluated by analyzing the waveform using a distributed circuit model. We found that the conductive puddles in the gated region induce significant dissipation in plasmon transport. For instance, a fractional interface channel with a reasonably fast velocity was obtained by preparing a fractional state in the ungated region and an integer state in the gated region, whereas a channel in the swapped configuration was quite dissipative. This reveals a high-quality interface channel that provides a clean path to transport fractional charges for studying various fractional QH phenomena.
Elementary quasi-particles in a two dimensional electron system can be described as exciton-polarons since electron-exciton interactions ensures dressing of excitons by Fermi-sea electron-hole pair excitations. A relevant open question is the modific
We report measurements of resistance oscillations in micron-scale antidots in both the integer and fractional quantum Hall regimes. In the integer regime, we conclude that oscillations are of the Coulomb type from the scaling of magnetic field period
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Protected edge modes are the cornerstone of topological states of matter. The simplest example is provided by the integer quantum Hall state at Landau level filling unity, which should feature a single chiral mode carrying electronic excitations. In