Integration of conventional mid to long-wavelength infrared polarizers with chip-scale platforms is restricted by their bulky size and complex fabrication. Van der Waals materials based polarizer can address these challenges due to its non-lithographic fabrication, ease of integration with chip-scale platforms, and room temperature operation. In the present work, mid-IR optical response of the sub-wavelength thin films of $alpha$-MoO$_3$ is investigated for application towards high temperature mid-IR transmission and reflection type thin film polarizer. To our knowledge, this is the first report of above room temperature mid-IR optical response of $alpha$-MoO$_3$ to determine the thermal stability of the proposed device. We find that our $alpha$-MoO$_3$ based polarizer retains high extinction ratio with peak value exceeding 10 dB, up to a temperature of 140$^{circ}$C. We explain our experimental findings by natural in-plane hyperbolic anisotropy of $alpha$-MoO$_3$ in the mid-IR, high temperature X-ray diffraction and Raman spectroscopic measurements. This work opens up new avenues for naturally in-plane hyperbolic van der Waals thin-films to realize sub-wavelength IR optical components without lithographic constraints.
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