ترغب بنشر مسار تعليمي؟ اضغط هنا

Extended X-ray absorption fine structure study of the Er bonding in AlNO:Er x films with x $le$ 3.6%

85   0   0.0 ( 0 )
 نشر من قبل Valerie Brien
 تاريخ النشر 2019
  مجال البحث فيزياء
والبحث باللغة English




اسأل ChatGPT حول البحث

The structural properties of Er-doped AlNO epilayers grown by radio frequency magnetron sputtering were studied by Extended X-ray Absorption Fine Structure (EXAFS) spectra recorded at the Er L 3 edge. The analysis revealed that Er substitutes for Al in all the studied samples and the increase in Er concentration from 0.5 to 3.6 at.% is not accompanied by formation of ErN, Er 2 O 3 or Er clusters. Simultaneously recorded X-ray Absorption Near Edge Structure (XANES) spectra verify that the bonding configuration of Er is similar in all studied samples. The Er-N distance is 2 constant at 2.18-2.19 {AA} i.e. approximately 15% larger than the Al-N bondlength, revealing that the introduction of Er in the cation sublattice causes considerable local distortion. The Debye-Waller factor, which measures the static disorder, of the second nearest shell of Al neighbors, has a local minimum for the sample containing 1% Er that coincides with the highest photoluminescence efficiency of the sample set.



قيم البحث

اقرأ أيضاً

We report the near-edge x-ray absorption fine structure (NEXAFS) spectrum of a single layer of graphite (graphene) obtained by micromechanical cleavage of Highly Ordered Pyrolytic Graphite (HOPG) on a SiO2 substrate. We utilized a PhotoEmission Elect ron Microscope (PEEM) to separately study single- double- and few-layers graphene (FLG) samples. In single-layer graphene we observe a splitting of the pi* resonance and a clear signature of the predicted interlayer state. The NEXAFS data illustrate the rapid evolution of the electronic structure with the increased number of layers.
121 - B. Joseph , A. Iadecola , A. Puri 2010
Local structure of FeSe(1-x)Te(x) has been studied by extended x-ray absorption fine-structure (EXAFS) measurements as a function of temperature. Combination of Se and Fe K edge EXAFS has permitted to quantify the local interatomic distances and thei r mean-square relative displacements. The Fe-Se and Fe-Te bond lengths in the ternary system are found to be very different from the average crystallographic Fe-Se/Te distance, and almost identical to the Fe-Se and Fe-Te distances for the binary FeSe and FeTe systems, indicating distinct site occupation by the Se and Te atoms. The results provide a clear evidence of local inhomogeneities and coexisting electronic components in the FeSe1-xTex, characterized by different local structural configurations, with direct implication on the fundamental electronic structure of these superconductors.
We report a study of the strain state of epitaxial MnSi films on Si(111) substrates in the thick film limit (100-500~AA) as a function of film thickness using polarization-dependent extended x-ray absorption fine structure (EXAFS). All films investig ated are phase-pure and of high quality with a sharp interface between MnSi and Si. The investigated MnSi films are in a thickness regime where the magnetic transition temperature $T_mathrm{c}$ assumes a thickness-independent enhanced value of $geq$43~K as compared with that of bulk MnSi, where $T_mathrm{c} approx 29~{rm K}$. A detailed refinement of the EXAFS data reveals that the Mn positions are unchanged, whereas the Si positions vary along the out-of-plane [111]-direction, alternating in orientation from unit cell to unit cell. Thus, for thick MnSi films, the unit cell volume is essentially that of bulk MnSi --- except in the vicinity of the interface with the Si substrate (thin film limit). In view of the enhanced magnetic transition temperature we conclude that the mere presence of the interface, and its specific characteristics, strongly affects the magnetic properties of the entire MnSi film, even far from the interface. Our analysis provides invaluable information about the local strain at the MnSi/Si(111) interface. The presented methodology of polarization dependent EXAFS can also be employed to investigate the local structure of other interesting interfaces.
We report new measurements and calculations of the non-resonant inelastic x-ray scattering (NRIXS) from Mg and Al for a wide range of momentum transfers, q. Extended oscillations in the dynamic structure factor S(q,w) due to scattering from the 2p an d 2s orbitals (i.e. L-edges) are observed out to more than 150 eV past the binding energy. These results are discussed in context of the recently proposed representation of S(q,w) for core shells as an atomic background modulated by interference between different photoelectron scattering paths, in analogy to the standard treatment of extended x-ray absorption fine structure. In agreement with this representation, we find a strong increase in the atomic background with increasing q with a concomitant enhancement in the amplitude of the extended fine structure. This effect should be generic and hence may enable improved measurement of the extended fine structure in a wide range of materials containing low-Z elements.
Oscillatory structure is found in the atomic background absorption in x-ray-absorption fine structure (XAFS). This atomic-XAFS or AXAFS arises from scattering within an embedded atom, and is analogous to the Ramsauer-Townsend effect. Calculations and measurements confirm the existence of AXAFS and show that it can dominate contributions such as multi-electron excitations. The structure is sensitive to chemical effects and thus provides a new probe of bonding and exchange effects on the scattering potential.
التعليقات
جاري جلب التعليقات جاري جلب التعليقات
mircosoft-partner

هل ترغب بارسال اشعارات عن اخر التحديثات في شمرا-اكاديميا