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This paper demonstrates and studies helium atmospheric pressure plasma jet comprised of series of repetitive streamer breakdowns, which is driven by a pure DC high voltage (auto-oscillations). Repetition frequency of the breakdowns is governed by the geometry of discharge electrodes/surroundings and gas flow rate. Each next streamer is initiated when the electric field on the anode tip recovers after the previous breakdown and reaches the breakdown threshold value of about 2.5 kV/cm. Repetition frequency of the streamer breakdowns excited using this principle can be simply tuned by reconfiguring the discharge electrode geometry. This custom-designed type of the helium plasma jet, which operates on the DC high voltage and is comprised of the series of the repetitive streamer breakdowns at frequency about 13 kHz, is demonstrated.
Motivated by the possibility of guiding daughter ions from double beta decay events to single-ion sensors for barium tagging, the NEXT collaboration is developing a program of R&D to test radio frequency (RF) carpets for ion transport in high pressur
To find a viable alternative to SF6 with growing climate change regulations, proper evaluation of alternatives such as compressed air ought to be done. For medium voltage applications, the withstand voltage is used as the dimensioning criteria and th
The goals of discovering quantum radiation dynamics in high-intensity laser-plasma interactions and engineering new laser-driven high-energy particle sources both require accurate and robust predictions. Experiments rely on particle-in-cell simulatio
Microwave sheath-Voltage combination Plasma (MVP) is a high density plasma source and can be used as a suitable plasma processing device (e.g., ionized physical vapor deposition). In the present report, the temporal behavior of an argon MVP sustained
We report measurements of transfer functions and flux shifts of 20 on-chip high T$_C$ DC SQUIDs half of which were made purposely geometrically asymmetric. All of these SQUIDs were fabricated using standard high T$_C$ thin film technology and they we