ترغب بنشر مسار تعليمي؟ اضغط هنا

Enhanced visible light absorption in ZnO/GaN heterostructured nanofilms

56   0   0.0 ( 0 )
 نشر من قبل Yang Zhang
 تاريخ النشر 2016
  مجال البحث فيزياء
والبحث باللغة English




اسأل ChatGPT حول البحث

ZnO/GaN alloys exhibit exceptional photocatalyst applications owing to the flexibly tunable band gaps that cover a wide range of the solar spectrum, and thus have attracted extensive attentions over the past few years. In this study, first-principles calculations were employed to investigate structural stabilities and electronic properties of (1-100) and (11-20) ZnO/GaN heterostructured nanofilms. The effects of nanofilm thickness and GaN ratio were explored. It was found that all studied heterostructured nanofilms were less stable than the corresponding pure ZnO film but more stable than pure GaN one, exhibiting a much thicker film with better stability. Electronic band structures displayed that both two types of (1-100) and (11-20) heterostructured nanofilms were semiconductors with band gaps strongly depending on the GaN ratios as well as the thicknesses. Of particular interesting is that the band gaps decreased firstly, and then increased with the increasing GaN ratio. Furthermore, electronic contribution to the valence band maximum and the conduction band minimum, and optical absorption were discussed. Our results of ZnO/GaN heterostructured nanofilms with spatial separation of electrons and holes, and flexibly tunable band gaps hold great promise for applications in visible-photovoltaic field.



قيم البحث

اقرأ أيضاً

A variety of organic-inorganic hybrid perovskites (APbX3) consisting of mixed center cations [A = CH3NH3+, HC(NH2)2+, Cs+] with different PbX3- cages (X = I, Br, Cl) have been developed to realize high-efficiency solar cells. Nevertheless, clear unde rstanding for the effects of A and X on the optical transition has been lacking. Here, we present universal rules that allow the unified interpretation of the optical absorption in various hybrid perovskites. In particular, we find that the influence of the A-site cation on the light absorption is rather significant and the absorption coefficient (alpha) reduces to half when CH3NH3+ is replaced with HC(NH2)2+ in the APbI3 system. Our density functional theory (DFT) calculations reproduce all of the fine absorption features observed in HC(NH2)2PbI3 and CH3NH3PbBr3, allowing the unique assignment of the interband transitions in the Brillouin zone. In contrast to general understanding that the A-site cation involves weakly in the optical process, our theoretical calculations reveal that the center cation plays a critical role in the interband transition and the absorption strength in the visible region is modified by the strong A-X interaction. Furthermore, our systematic analyses show that the variation of the absorption spectrum with X can be described simply by the well-known sum rule. The universal rules established in this study explain the large reduction of alpha in HC(NH2)2PbI3 and predict CsPbI3 as the highest alpha material.
729 - Y. Lei , Y. Z. Chen , Y. W. Xie 2014
Electrical field and light-illumination have been two most widely used stimuli in tuning the conductivity of semiconductor devices. Via capacitive effect electrical field modifies the carrier density of the devices, while light-illumination generates extra carriers by exciting trapped electrons into conduction band1. Here, we report on an unexpected light illumination enhanced field effect in a quasi-two-dimensional electron gas (q2DEG) confined at the LaAlO3/SrTiO3 (LAO/STO) interface which has been the focus of emergent phenomenon exploration2-14. We found that light illumination greatly accelerates and amplifies the field effect, driving the field-induced resistance growth which originally lasts for thousands of seconds into an abrupt resistance jump more than two orders of magnitude. Also, the field-induced change in carrier density is much larger than that expected from the capacitive effect, and can even be opposite to the conventional photoelectric effect. This work expands the space for novel effect exploration and multifunctional device design at complex oxide interfaces.
Sn-containing Si and Ge alloys belong to an emerging family of semiconductors with the potential to impact group IV semiconductor devices. Indeed, the ability to independently engineer both lattice parameter and band gap holds the premise to develop enhanced or novel photonic, optoelectronic, and electronic devices. With this perspective, we present detailed investigations of the influence of Ge1-y-xSixSny layers on the optical properties of Si- and Ge-based heterostructures and nanowires. We found that adding a thin Ge1-x-ySixSny capping layer on Si or Ge greatly enhances light absorption especially in the near IR range leading to an increase in short-circuit current density. For the Ge1-y-xSixSny structure at thicknesses below 30 nm, a 14-fold increase in the short-circuit current is predicted with respect to bare Si. This enhancement decreases by reducing the capping layer thickness. Conversely, decreasing the shell thickness was found to improve the short-circuit current in Si/Ge1-y-xSixSny and Ge/Ge1-y-xSixSny core/shell nanowires. The optical absorption becomes very important when increasing the Sn content. Moreover, by exploiting optical antenna effect, these nanowires show an extreme light absorption reaching an enhancement factor, with respect to Si or Ge nanowires, on the order of ~104 in Si/Ge0.84Si0.04Sn0.12 and ~12 in Ge/Ge0.84Si0.04Sn0.12 core/shell nanowires. Furthermore, we analyzed the optical response of the addition of a dielectric capping layer consisting of Si3N4 to the Si/Ge1-y-xSixSny core-shell nanowire and found about 50% increase in short-circuit current density for a dielectric layer thickness of 45 nm and a core radius and shell thickness superior to 40 nm. The core/shell optical antenna benefits from a multiplication of enhancements contributed by leaky mode resonances in the semiconductor part and antireflection effects in the dielectric part.
105 - O. Jamadi , F. Reveret , E. Mallet 2015
GaN and ZnO microcavities have been grown on patterned silicon substrate. Thanks to a common platform these microcavities share similar photonic properties with large quality factors and low photonic disorder which gives the possibility to determine the optimal spot diameter and to realize a complete comparative phase diagram study. Both systems have been investigated under the same experimental condition. Experimental results are well reproduced by simulation using Boltzmann equations. Lower polariton lasing threshold has been measured at low temperature in the ZnO microcavity as expected due to a larger Rabi splitting. However the threshold is strongly impacted by LO phonons through phonon-assisted polariton relaxation. We observe and discuss this effect as a function of temperature and detuning. Finally the polariton lasing threshold at room temperature is quite similar in both microcavities. This study highlights polariton relaxation mechanism and their importance for threshold optimization.
Semiconductor compounds are widely used for water splitting applications, where photo-generated electron-hole pairs are exploited to induce catalysis. Recently, powders of a metallic oxide (Sr$_{1-x}$NbO$_3$, 0.03 < x < 0.20) have shown competitive p hotocatalytic efficiency, opening up the material space available for finding optimizing performance in water-splitting applications. The origin of the visible light absorption in these powders was reported to be due to an interband transition and the charge carrier separation was proposed to be due to the high carrier mobility of this material. In the current work we have prepared epitaxial thin films of Sr$_{0.94}$NbO$_{3+{delta}}$ and found that the bandgap of this material is ~4.1 eV, which is very large. Surprisingly the carrier density of the conducting phase reaches 10$^{22}$ cm$^{-3}$, which is only one order smaller than that of elemental metals and the carrier mobility is only 2.47 cm$^2$/(V$cdot$s). Contrary to earlier reports, the visible light absorption at 1.8 eV (~688 nm) is due to the bulk plasmon resonance, arising from the large carrier density, instead of an interband transition. Excitation of the plasmonic resonance results in a multifold enhancement of the lifetime of charge carriers. Thus we propose that the hot charge carriers generated from decay of plasmons produced by optical absorption is responsible for the water splitting efficiency of this material under visible light irradiation.
التعليقات
جاري جلب التعليقات جاري جلب التعليقات
سجل دخول لتتمكن من متابعة معايير البحث التي قمت باختيارها
mircosoft-partner

هل ترغب بارسال اشعارات عن اخر التحديثات في شمرا-اكاديميا